Gas Distribution Ring

This gas distribution ring is used for coating wafers for the chip industry. The prototype, with a diameter of 380 mm, was manufactured in 2017. Alumina Systems was awarded the “Best Components Award” by the trade magazine “Ceramic Applications” in 2018 for this innovative product.

Category

Description

This gas distribution ring is used for coating wafers for the chip industry. The prototype, with a diameter of 380 mm, was manufactured in 2017. Alumina Systems was awarded the “Best Components Award” by the trade magazine “Ceramic Applications” in 2018 for this innovative product. Diameters up to 1,000 mm can now be manufactured.

The advantages of the gas distribution ring in detail:

  • Higher efficiency 50% faster wafer coating Etching and coating in a single system
  • Highest process quality
  • Significantly lower variance in layer thickness
  • Uniform gas distribution thanks to precise nozzles
  • Reduced process temperatures: from 400°C to 200°C down to -40°C
  • Maximum service life
  • High corrosion resistance of the ceramic